Raith 150 E-beam Lithography System

Ultra high resolution Ebeam lithography and metrology tool. suitable for the development of Nanolithographic structures for microelectronic, MEMS, Photonic, and Integrated optical devices.

• Ultimate resolution specified to 60nm with sub-30 features possible.
• Accurate field stitching (~50nm) and overlay to better than 30nm typical.
• Ultra high resolution, low voltage SEM inspection with advanced sample navigation and metrology software packages.
• Direct E-beam exposure for chips and wafers to 150 mm diameter.